Laser nano and micromanufacturing lab

dy, parameterise and perform laser processes with dimensional tolerances in the micrometric and sub-micrometric range, on any type of material. The service currently has femtosecond (fs) pulsed laser sources with a pulse width programmable to 1030 nm (EKSPLA Femtolux 30), picosecond (ps) pulsed sources at 355 nm, 532 nm and 1064 nm (LUMERA Super Rapid and Spectra Physics Vanguard), and various nanosecond (ns) sources at 355 nm, 532 nm and 1064 nm (including a high-power UV source). All of the lasers are integrated into machines or process benches and have scanners, beam control and shaping systems and different focusing systems, making it possible to use any strategy for irradiating the material and simulate process conditions in production environments. The service also has the instrumentation necessary to characterise processes in situ, including a Hitachi 3000N scanning electron microscope, a Leica DCM 3D confocal and interferometric microscope and a Raman Renishaw inVia microscope. ...